Evaluation of damage depth on arginine films with molecular depth profiling by Ar cluster ion beam

Molecular depth profiling with cluster ion beams.

Peptide-doped trehalose thin films have been characterized by bombardment with energetic cluster ion beams of C60+ and Aux+ (x = 1, 2, 3). The aim of these studies is to acquire information about the molecular sputtering process of the peptide and trehalose by measurement of secondary ion mass spectra during erosion. This system is important since uniform thin films of approximately 300 nm thic...

Dual beam organic depth profiling using large argon cluster ion beams

Argon cluster sputtering of an organic multilayer reference material consisting of two organic components, 4,4'-bis[N-(1-naphthyl-1-)-N-phenyl- amino]-biphenyl (NPB) and aluminium tris-(8-hydroxyquinolate) (Alq3), materials commonly used in organic light-emitting diodes industry, was carried out using time-of-flight SIMS in dual beam mode. The sample used in this study consists of a ∽400-nm-thi...

Molecular Depth Profiling.

Bombardment of molecular solids with polyatomic projectiles allows interrogation of the sample with reduced chemical damage accumulation. Hence, it is now common to perform depth profiling experiments using a variety of substrates in a fashion similar to that reported for inorganic materials in use for many decades. The possibility for chemical processes, however, creates a number of fundamenta...

Molecular depth profiling by wedged crater beveling.

Time-of-flight secondary ion mass spectrometry and atomic force microscopy are employed to characterize a wedge-shaped crater eroded by a 40-keV C(60)(+) cluster ion beam on an organic film of Irganox 1010 doped with Irganox 3114 delta layers. From an examination of the resulting surface, the information about depth resolution, topography, and erosion rate can be obtained as a function of crate...

Cathodoluminescence depth profiling of ion-implanted GaN